This next-generation accessory offers the widest commercially available interferometric field-of-view (FOV) for high-speed, high-precision surface metrology—delivering a remarkable 60 mm FOV in a single measurement. Designed to meet the evolving needs of industries such as semiconductor, photonics, AR waveguides, and precision machining, the 0.5X ZWF Objective enables rapid, accurate measurements of rough to smooth surfaces, including those with transparent or semi-transparent films.

(July 22nd, 2025, Middlefield, CT, USA] Zygo, a business unit of AMETEK, Inc. (NYSE: AME) and a global leader in precision metrology and optical solutions, is proud to announce its participation in the upcoming SPIE Optics + Photonics 2025 event, taking place August 3-7 in San Diego, CA. At booth #315, Zygo will debut the 0.5X ZWF (Zygo Wide Field) Objective, a revolutionary new accessory developed specifically for its non-contact optical profiler product line.

This next-generation accessory offers the widest commercially available interferometric field-of-view (FOV) for high-speed, high-precision surface metrology—delivering a remarkable 60 mm FOV in a single measurement. Designed to meet the evolving needs of industries such as semiconductor, photonics, AR waveguides, and precision machining, the 0.5X ZWF Objective enables rapid, accurate measurements of rough to smooth surfaces, including those with transparent or semi-transparent films.

"We're excited to bring the 0.5X ZWF Objective to SPIE Optics + Photonics," says Sean Leavy, Product Manager at Zygo. "This objective solves a critical industry challenge, enabling fast, high-fidelity measurements across large areas. It's a transformative tool for both research labs and high-throughput production lines."

Key Features of the 0.5X ZWF Objective:
• Single-scan measurements of large fields, ideal for flatness, waviness, and film thickness analysis
• Seamless surface stitching for oversized samples with unmatched repeatability
• 45 mm working distance and 19.0 µm optical resolution, optimized for industrial applications
• Intelligent Mx™ software with Part Finder and SmartSetup™ for simplified focus and alignment

Whether inspecting semiconductor wafers, optical stacks, or machined components, the 0.5X ZWF Objective—purpose-built for Zygo's non-contact optical profilers—delivers faster, more actionable metrology data. In many applications, it reduces stitch times by up to 75%, significantly boosting throughput without sacrificing precision.

"By removing traditional FOV constraints, we're opening the door to a new era of efficiency," adds Leavy. "We look forward to showing visitors exactly how this technology can elevate their metrology workflows."

Visit Zygo at Booth #315
Attendees at SPIE Optics + Photonics 2025 are invited to visit Zygo's booth for live demonstrations and expert insights into how the 0.5X ZWF Objective is redefining large-area, high-speed interferometric metrology.